Thursday, April 26, 2012

Basics of solar cells.

Continue learning the basics. technology of silicon solar cells for terrestrial applications, which began with a description of operations. chemical treatment of the original plates.

Heart ' of the solar cell.


As you know, the heart of crystalline silicon solar cells is a pn junction. What is it? . However, if the plate of the same type to create a layer of another type, then the contact of these areas and will be a pn junction. In general, the pn junction - this is one of the key concepts of solid-state microelectronics. With the use of physical effects that occur in or near work such well-known products as diodes, transistors and many other more complex circuits.

One of the main properties of the pn junction is its ability to be a barrier to the carriers, m. e. pass them in only one direction. It is this effect and is based generation of electric current in solar cells. The radiation falling on the surface of the element, generates in the bulk carriers with different signs - electrons (n) and holes (p). Due to its properties the pn junction, ...

So how do you form a pn junction?.



The simplified design of a solar cell with a pn junction.


As we remember, first initial of the plate are. multiple stages of chemical processing. , So that their surface becomes necessary for us the structure and purity. Typically in the manufacture of solar cells used the original plates with p-type conductivity. To do this, silicon is still at the stage of growing ingots alloyed with relevant impurities such as boron. Therefore, to create in it n- layer should be one of the surfaces to introduce another element of the impurity, which compensates the action of boron and saturate the semiconductor charge carriers n-type. This can be done by introducing phosphorus in silicon or other suitable admixture of the corresponding part of the periodic table.

One of the most traditional and economically sound way to fill the silicon is phosphorus diffusion, m. e. a process in which phosphorus is subjected to high temperatures penetrate into the semiconductor. Traditionally, the diffusion of phosphorus is carried out in tube or conveyor ovens at temperatures around 800 ° C.. In the first case, the plate is placed in a quartz tape and a tube furnace filled with pairs of substances containing phosphorus. By adjusting the time spent wafers in the reactor temperature and gas flow within him, technologists are pn junction with the necessary properties to them. In the second case of phosphorus-containing compound is sprayed onto the surface of plates lying on a conveyor belt furnace. After that the plates are moved by conveyor to the next area, which is also subjected to high temperature treatment.

As a result of phosphorus diffusion on the surface and the ends of the silicon wafer thickness of 200 microns is formed by a layer of n-type, penetrating to a depth of about 0.5 microns. T. e. pn junction lies at the surface of the solar cell. This is done to ensure that the charge carriers of different signs generated by the radiation, as soon as got into the zone of influence of the pn junction, otherwise they simply will meet again with each other and thus cancel out, and not giving any contribution to the generation of electric current.

Especially for the site '. Solar Energy. '.

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Tuesday, April 24, 2012

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